Surface Profiler







Contact

David Woods
Phone: 505-2777-2761
e-mail: dmwoodsunm.edu

The electrical equipments consist of:
  • Osciloscopes
  • Signal generators
  • Custom made high frequency voltage amolifiers
  • Multimeters
  • Conections
Contact

Khawar Abbas
Phone: 505-272-7159
e-mail: kabbas@unm.edu

Ovens and Furnaces

There are a couple of ovens and furnaces available. The specific one seen here is a relatively small one. This programable oven faciliates inserting small samples from a small opening at the top sutrface while the main door can always be used to inset bigger samples. This oven can 1200 degrees centigrade.

Contact

Ronald Salesky
Phone: 505 277-2862
e-mail: rsalesky@unm.edu

Laser Doppler Vibrometer(LDV)

This equipment is capable of measuring the velocity of very fact oscilating objects with an accuracy of a couple of nanometers. It uses the velocity data to obtain the displacement and also the acceleration of the moving object. This device is very appropriate for characterisinf the highfrequency and small amplitude vibrations of MEMS/NEMS devices.

Contact

Khawar Abbas
Phone: 505-272-7159
e-mail: kabbas@unm.edu

Laser-Cutting Probe Stage Microscope

This microscope is equipted wih laser cutting tool ad probe stages to faciliate cutting or freering a part of a MEMS device. It can also be used to repair stiction failed MEMS devices using laser induced vibrations or laser induced heating.

Contact

Khawar Abbas
Phone: 505-272-7159
e-mail: kabbas@unm.edu

Optics Bench

This optics bench is a vibrationally isolated floating bench. It seats on four air actuated legs and isolates all the devices on it from high frequency vibrations that cn be transmitted through floor.

Contact

Khawar Abbas
Phone: 505-272-7159
e-mail: kabbas@unm.edu

3D Prototyper







Contact

Stoney Haver
Phone: 505-272-2761
e-mail: shaver69@unm.edu

OptoPro 622- X

This instrument is capable of3D imaging and metrology of MEMS devices. It has a long working-distance which allows standard probes to be used and provides the ability to make measurements through windows. Using this equipment we can get nanometer-scale 3D surface profile across a wafer. It uses a green incoherent light emitting diode (LED) and a 2/3-inch black & white CCD video camera.

Contact

Arash Mousavi
Phone: 316-573-3773
e-mail: mousavi@unm.edu

Xenone Diflouride Etching Chamber

The XeF2 etching chamber is a dryetching chamer which uses XeFe gas to etch silicon. This chamber is controlled by labview and the pressure and etching times are accuratly controllable. This system works at very low pressures and used a couple of suplimentary tanks to store, expand and dump the gasses.

Contact

Joe Butner
Phone: 505-277-2761
e-mail: liljoe@unm.edu

Rapid Prototyoer






Contact

David Woods
Phone: 505-2777-2761
e-mail: dmwoods@unm.edu

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